سال انتشار: ۱۳۹۳
محل انتشار: دومین همایش ملی پژوهش های کاربردی در ریاضی و فیزیک
تعداد صفحات: ۹
M shahryari – Department of physics, Faculty of Science, Islamic Azad University, Karaj Branch, Karaj, Iran
sh nanekarani – Department of physics, Faculty of Science, Islamic Azad University, Karaj Branch, Karaj, Iran
In this paper, Ti/p- si schottky diode has been fabricated by deposition a titanium film on p-si substrate by dc magnetron sputtering. Electrical properties schottky junction inclusive 3 main parameters: ideality factor (n), series resistance (Rs) and barrier height (Φb) were determined by 3 analysis methods: current-voltage, Cheung function and Norde function. As result the calculated values outcome by 3 analysis methods averagely were obtained equal to 2.475, 27.07kΩ and 0.88 ev, respectively.Direct calculation series resistance and compare that with the average value obtain from 3 analysis methods that mentioned illustrate that without attention to XRD analysis can deduce at least one oxide phase was formed on Ti layer.